Scaling a CUDA-Q GQE + QSCI pipeline to 40 qubits for EUV photoresist chemistry: generative quantum eigensolver circuits, quantum-selected configuration interaction, and real-QPU runs on tin-based resist molecules.
Research-grade simulator for 0.55 NA High-NA EUV lithography. Models the path from 13.5 nm source through anamorphic optics to wafer aerial image, with Mask 3D effects, photoresist, and SMO/PMWO optimization.
A robust AFM-based line-edge roughness measurement workflow using imec-recommended scan and analysis settings.
Electronics (всё в одном репозитории).
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