This repository contains followings:
- Presentation slides
- Experiment notebook
As semiconductor manufacturing becomes complicated, and the difficulty of the refined process techniques increases, it is crucial to classify wafer maps automatically to eliminate the cause of defects. In this project, we are going to develop deep learning model to identify the defect patterns from input images in a supervised manner.
According to the EDA analysis, data with label & pattern only takes only 3.1% of total data and the distribution of label for different failure is imbalance. Thus we are only considering data with labels in the training process.
Here we are going to reshape images to have same dimension and using (R, G, B) channel to represent different area.
For data augmentation, we trained AutoEncoder Model to oversampling minority class by adding gaussian noise, and we also use random undersampling technique to undersample majority class. By doing that, we have achieved the number of samples for each pattern below.
We utilized the following parts in the CNN model,
- Feature Learning Layers
Convolution + RELU + MaxPool - Classifier (Fully Connected Layers)
Linear Layers + RELU + SoftMax - Loss Function
Cross Entropy Loss
After we trained 10 epochs for 5 cross validation fold, we have achieved 99.61% accuracy.





